Dry etching equipment and electrode of dry etching equipment

The invention discloses dry etching equipment and an electrode of the dry etching equipment. The electrode of the dry etching equipment comprises an electrode plate, a stop ring and a partition board, wherein a component placing area and an edge area surrounding the component placing area are arrang...

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Bibliographic Details
Main Author WEN JUNBIN
Format Patent
LanguageChinese
English
Published 15.09.2017
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Summary:The invention discloses dry etching equipment and an electrode of the dry etching equipment. The electrode of the dry etching equipment comprises an electrode plate, a stop ring and a partition board, wherein a component placing area and an edge area surrounding the component placing area are arranged on the surface of the electrode plate; the stop ring is arranged in the edge area and is arranged at the periphery of the component placing area; and the partition board is arranged at the outer side of the electrode board, is adjacent to the periphery of the stop ring and is provided with a plurality of perforations. According to the dry etching equipment and the electrode of the dry etching equipment, the uniform distribution condition of the flow direction of etching gas is improved. 本申请种干蚀刻设备及干蚀刻设备的电极,所述干蚀刻设备的电极,包括:电极板,表面包括组件放置区及环绕所述组件放置区的边缘区;阻挡环,设置在所述边缘区,位于所述组件放置区的外围;以及隔板,设置在所述电极板外侧,邻接所述阻挡环的外围,所述隔板具有多个穿孔。藉以提升蚀刻气体流动方向的均匀分布情形。
Bibliography:Application Number: CN201710302181