Chemical vapor film deposition device

• Main Author: WEN JUNBIN
• Format: Patent
• Language: Chinese; English
• Published: 08.09.2017
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The invention discloses a chemical vapor film deposition device. The chemical vapor film deposition device comprises a processing cavity, a transfer cavity, a bearing cavity, a first vacuum pump for vacuumizing the transfer cavity, and a second vacuum pump for vacuumizing the bearing cavity; and the transfer cavity is connected with the second vacuum pump through a communicating pipeline. The second vacuum pump for vacuumizing the bearing cavity is fully used; and the communicating pipeline is additionally arranged between the transfer cavity and the second vacuum pump for connection, so that the first vacuum pump and the second vacuum pump can vacuumize the transfer cavity at the same time, the vacuumizing speed of the transfer cavity can be accelerated, the vacuumizing time after maintenance is shortened, and early resetting is realized. The first vacuum pump and the second vacuum pump are adopted to vacuumize the transfer cavity at the same time, so that the vacuumizing time can be shortened. 本发明公开种化学气相沉膜装