Detection device and method for judging and recording position of silicon wafers

• Main Authors: LIU ZHIFENG, WEN JUNWU, WANG BING, YANG CONGBIN, TAO WENXIU
• Format: Patent
• Language: Chinese; English
• Published: 05.09.2017
• Subjects: CHAMBERS PROVIDED WITH MANIPULATION DEVICES; HAND TOOLS; MANIPULATORS; MEASURING; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS; PERFORMING OPERATIONS; PHYSICS; PORTABLE POWER-DRIVEN TOOLS; TESTING; TRANSPORTING

The invention discloses a detection device and method for judging and recording the position of silicon wafers, and belongs to the technical field of semiconductor carrying equipment. According to the invention, slots of a silicon wafer box are arranged in a trapezoidal manner, the upper end of the silicon wafer box is provided with an opening, the edge of a silicon wafer at each layer can be observed when the silicon wafers are seen from top to bottom, an infrared distance sensor is installed above the silicon wafer box, a signal transmitting path is along the vertical direction, an air cylinder drives the sensor to move in a straight line manner, a signal transmitting diode of the sensor transmits signals to the silicon wafers through the opening at the upper end of the silicon wafer box, the signals are reflected by the edge of the silicon wafer at each layer and received by a receiving diode, signals reflected by the silicon wafers located at different layers are different, the reflected signals are trans