SUBSTRATE LIQUID PROCESSING DEVICE AND SUBSTRATE LIQUID PROCESSING METHOD

• Main Authors: TANAKA KOJI, SHIOKAWA TOSHIYUKI, TANAKA YUJI, SATO TAKAZO, MASUTOMI HIROYUKI, HIRAYAMA TSUKASA, INADA TAKASHI
• Format: Patent
• Language: Chinese; English
• Published: 04.08.2017
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

The invention provides a substrate liquid processing device capable of uniformly processing a substrate with a process liquid. A substrate liquid processing device (1) comprises: a processing tank (34) in which a plurality of substrates (8) is immersed in a process liquid and processed while being arrayed; and a process liquid supply nozzle (49) which is disposed at a lower side of the substrates (8) within the processing tank (34) and with which a discharge port (76) is formed for discharging the process liquid in a tube body (74) extending in an array direction of the substrates (8). The discharge port (76) forms a first side surface (78) and a second side surface (79) while spacing them apart from each other in a horizontal direction that is orthogonal with the array direction of the substrates (8), and is provided at positions (A1 and C1) where outside edges of the first side surface (78) or/and the second side surface (79) are opened in the horizontal direction further outward than at positions (B1 and D