Gas control system and control method for gas control system

• Main Authors: MINAMI, MASAKAZU, TAKIJIRI, KOTARO, NISHIZATO, HIROSHI, TERAOKA ATSUKO
• Format: Patent
• Language: Chinese; English
• Published: 01.08.2017
• Subjects: BLASTING; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; CONTROLLING; DIFFUSION TREATMENT OF METALLIC MATERIAL; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; HEATING; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES; LIGHTING; MEASURING; MECHANICAL ENGINEERING; METALLURGY; PHYSICS; PIPE-LINE SYSTEMS; PIPE-LINES; REGULATING; STORING OF DISTRIBUTING GASES OR LIQUIDS; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES; TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION; TECHNICAL SUBJECTS COVERED BY FORMER USPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS; TESTING; WEAPONS

The invention provides a gas control system capable of supplying a mixed gas at a predetermined concentration or flow rate, preventing droplets produced by the reliquefaction of the material gas or particles produced by the thermal decomposition of the material from affecting the concentration or flow control. The gas control system includes: a first valve that is provided in a carrier gas line or in a gas supply line; a flow rate control mechanism that is provided in a diluent gas line and includes a flow rate sensor and a second valve; a contactless type first concentration sensor; a first valve control part; a diluent gas setting flow rate calculation part adapted to, on the basis of a preset setting total flow rate of a post-dilution mixed gas and a post-dilution measured concentration, calculate a diluent gas setting flow rate that is a flow rate of a diluent gas to be flowed through the diluent gas line; and a second valve control part adapted to control the opening level of the second valve so as to de