SAMPLE ANALYSIS SYSTEM AND APPARATUS, CLEANING LIQUID PREPARATION APPARATUS, AND CLEANING LIQUID SUPPLY METHOD

• Main Authors: RYUKI TAKAGI, YUJI WAKAMIYA
• Format: Patent
• Language: Chinese; English
• Published: 23.06.2017
• Subjects: INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES; MEASURING; PHYSICS; TESTING

The invention provides a sample analysis system and apparatus, a cleaning liquid preparation apparatus, and a cleaning liquid supply method which make the prepared cleaning liquid to be a substantial part of stored cleaning liquid and enables the stored liquid to quickly clean the sample analysis apparatus. According to the invention, the sample analysis system (100) comprises a cleaning liquid preparation apparatus (4) that prepares a cleaning liquid and a sample analyzer (1) which comprises a measurement unit (2) that measures a sample and a reservoir that stores the cleaning liquid prepared by the cleaning liquid preparation apparatus (4). The sample analyzer (1) cleans at least a part of the measurement unit (2) with the cleaning liquid. The cleaning liquid preparation apparatus (4) selectively executes a first supply mode to supply the cleaning liquid to the reservoir when a liquid amount in the reservoir reaches a first amount, and a second supply mode to supply the cleaning liquid to the reservoir when