SENSOR, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

• Main Authors: KOOIKER EELCO, WESTERLAKEN JAN STEVEN CHRISTIAAN, VAN DE WAL JOHANNES, HURKENS-MERTENS WILHELMINA MARGARETA JOZEF, JACOBS JOHANNES HENRICUS WILHELMUS, KNARREN BASTIAAN, TEILLET YOHANN BRUNO YVON, VAN DE VIJVER YURI, VOOGD ROBBERT JAN, KOK HAICO, LAURENT THIBAULT, VAN DE RIJDT HANS
• Format: Patent
• Language: Chinese; English
• Published: 20.06.2017
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

The invention provides a sensor for an immersion lithographic apparatus, the lithographic apparatus and a device manufacturing method using the immersion lithographic apparatus. The sensor comprises the components of a component which contacts with immersion liquid that is supplied to a space that is adjacent with a final element of a projection system; a transducer which is configured for converting stimulation into an electric signal; a temperature regulating device which is configured for performing speed regulation of the transducer by means of a heat transfer medium that is supplied by a coolant supplying device; and a controller which is configured for controlling the temperature regulating device for actively controlling the temperature of the transducer. 本发明提供了种用于浸没光刻设备中的传感器、光刻设备和使用浸没光刻设备的器件制造方法。所述传感器包括构件，在传感器的使用过程中所述构件接触供给至与投影系统的最终元件相邻的空间的浸没液体；变换器，配置成将刺激转换为电信号；温度调节装置，配置成使用由冷却剂供给装置所供给的热传递介质进行所述变换器的温度调节；和控制器，配置成控制所述温度调节装置以主动地控制所述变换器的温度。