Light-emitting diode and manufacturing method thereof
The invention discloses a manufacturing method of a light-emitting diode. The manufacturing method comprises the following steps: providing an epitaxial structure containing a growth substrate, a first-type semiconductor layer, an active layer and a second-type semiconductor layer in sequence; formi...
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Main Authors | , , , |
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Format | Patent |
Language | Chinese English |
Published |
31.05.2017
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Subjects | |
Online Access | Get full text |
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Summary: | The invention discloses a manufacturing method of a light-emitting diode. The manufacturing method comprises the following steps: providing an epitaxial structure containing a growth substrate, a first-type semiconductor layer, an active layer and a second-type semiconductor layer in sequence; forming an expansion electrode on the surface of the second-type semiconductor layer, and carrying out heat treatment to form Ohmic contact with the second-type semiconductor layer; providing a temporary substrate, jointing the temporary substrate with the epitaxial structure, and removing the growth substrate, so that the surface of the first-type semiconductor layer is exposed; forming an Ohmic contact layer, a mirror surface layer and a bonding layer in sequence on the exposed surface of the first-type semiconductor layer; providing a conducting substrate, jointing the conducting substrate with the bonding layer, and removing the temporary substrate, so that the surface of the second-type semiconductor layer and the |
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Bibliography: | Application Number: CN201611196635 |