Hydrothermal method preparation technology for BiVO4 nanowires

The invention discloses a hydrothermal method preparation technology for BiVO4 nanowires and belongs to the technical field of semiconductor nanomaterial preparation. The hydrothermal method preparation technology comprises the steps: firstly, spin coating and calcining a BiVO4 seed solution on FTO...

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Bibliographic Details
Main Authors WANG QIUHONG, DUAN SHIFANG, LI YANG, GENG YUANYUAN, HE CAIHUA, QUAN JINGJING, QIN DONGDONG
Format Patent
LanguageChinese
English
Published 31.05.2017
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Summary:The invention discloses a hydrothermal method preparation technology for BiVO4 nanowires and belongs to the technical field of semiconductor nanomaterial preparation. The hydrothermal method preparation technology comprises the steps: firstly, spin coating and calcining a BiVO4 seed solution on FTO glass to obtain a BiVO4 seed layer; then preparing BiVO4 nanowires in a reaction kettle through a hydrothermal method; finally, putting the prepared BiVO4 nanowires in a tube furnace to be annealed in high temperature. The hydrothermal method preparation technology disclosed by the invention is simple in preparation process, easy to operate, free of expensive equipment in the whole preparation process and low in cost; the prepared BiVO4 nanowires have good crystal form and high photocatalytic activity; the preparation process is performed in the reaction kettle, so that the FTO glass is convenient to take and put, and a sample is prevented from being damaged; furthermore, temperature in the reaction kettle can be v
Bibliography:Application Number: CN2017142462