Method of cutting metal gate

• Main Author: YANG KAIIEH
• Format: Patent
• Language: Chinese; English
• Published: 24.05.2017
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

A method of cutting a metal gate includes forming a first fin and a second fin on a substrate, forming a first metal-gate line over a first and a second gate regions, applying a first line-cut to separate the first metal-gate line into a first sub-metal gate line and a second sub-metal gate line and forming a second metal-gate line over the first sub-metal gate line and the second sub-metal gate line, applying a second line-cut to separate the second metal-gate line into a third sub-metal gate line and a fourth sub-metal gate line such that a gap is formed between the third sub-metal gate line and the fourth sub-metal gate line and forming an isolation region within the gap. 种切割金属栅极的方法，包括在基板上形成第鳍及第二鳍，在第及第二栅极区域上形成第金属栅极接线，应用第线切割以将第金属栅极接线分离为第子金属栅极接线及第二子金属栅极接线及在第子金属栅极接线及第二子金属栅极接线上形成第二金属栅极接线，应用第二线切割以将第二金属栅极接线分离为第三子金属栅极接线及第四子金属栅极接线以使得在第三子金属栅极接线与第四子金属栅极接线之间形成缝隙及在缝隙内形成隔离区域。