Substrate treatment device and method

• Main Authors: ZHU YU, YUE WEIWEN, ZHANG PING, SHENTU JIANGMIN, GONG YANG
• Format: Patent
• Language: Chinese; English
• Published: 24.05.2017
• Subjects: DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS; GRINDING; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; PERFORMING OPERATIONS; POLISHING; TRANSPORTING

The invention relates to the technical field of panel display, in particular to a substrate treatment device and method. The substrate treatment device at least comprises a conveying mechanism, a chamfering mechanism and a frequency converter. The conveying mechanism is used for loading and conveying substrates. The chamfering mechanism is adjacent to at least one side of the conveying mechanism, and the conveying mechanism conveys the substrates to pass through the chamfering mechanism. The frequency converter is used for monitoring and adjusting the rotation speed of the chamfering mechanism, the frequency converter sets the rotation speed critical value as the first speed, and when the rotation speed of the chamfering mechanism is lower than the first speed, the frequency converter adjusts the chamfering mechanism to recover to the speed higher than the first speed. In addition, the invention further relates to the substrate treatment method. According to the substrate treatment device and method, the rota