Method to fabricate mask-pellicle system and formation method of mark protection system

A method for fabricating a pellicle assembly includes forming a release layer over a carrier. A membrane layer is fabricated over the release layer. A pellicle frame is attached to the membrane layer. After attaching the pellicle frame to the membrane layer, a release treatment process is performed...

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Bibliographic Details
Main Authors CHIN SHENGI, CHU YUANIH, TSENG CHUN-HAO
Format Patent
LanguageChinese
English
Published 29.03.2017
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:A method for fabricating a pellicle assembly includes forming a release layer over a carrier. A membrane layer is fabricated over the release layer. A pellicle frame is attached to the membrane layer. After attaching the pellicle frame to the membrane layer, a release treatment process is performed to the release layer to separate the carrier from the membrane layer. A pellicle assembly including the pellicle frame and the membrane layer attached to the pellicle frame is formed. 本公开提供制造护膜组件的方法，此方法包含在载板上方形成脱模层，在脱模层上方制造膜层，将护膜框架附着至膜层，在护膜框架附着至膜层之后，对脱模层实施脱模处理工艺将载板从膜层分开，形成护膜组件，护膜组件包含护膜框架和附着至护膜框架的膜层。
Bibliography:Application Number: CN201510859792