Exposure machine and image shift prevention method and system thereof

• Main Author: WEN JUNBIN
• Format: Patent
• Language: Chinese; English
• Published: 22.03.2017
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

The embodiment of the invention provides an exposure machine and an image shift prevention method and system thereof. By arranging a dustproof cover made of transparent material at one end where a bearing and a lifting rod are connected, it is convenient to detect whether the bearing is worn or not by a manual or machine visual mode, so that a local shift phenomenon generated by a photoresist image caused by wear of the bearing and residue falling is effectively prevented, the yield of a glass substrate obtained through photoetching during the yellow light process can be effectively improved, and the production efficiency of the yellow light process is improved. 本发明实施例提供种曝光机及其图像偏移防治方法和系统，通过在轴承和升降杆相连接的端设置由透明材料制成的防尘罩，便于通过人工或机器视觉方式检测轴承是否已磨损，从而有效防治因轴承磨损掉落残渣而导致的光阻图像产生局部偏移的现象，可以有效提高黄光制程中经光刻蚀得到的玻璃基板的良品率，从而提高黄光制程的生产效率。