Film formation mask, method for producing film formation mask, and touch panel

• Main Author: MIZUMURA MICHINOBU
• Format: Patent
• Language: Chinese; English
• Published: 08.03.2017
• Subjects: ALLOYS; CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS ANDNON-FERROUS ALLOYS; CHEMISTRY; FERROUS OR NON-FERROUS ALLOYS; METALLURGY; TREATMENT OF ALLOYS OR NON-FERROUS METALS

The present invention is provided with: a mask layer (1) having an opening pattern (4) identical in shape and size to a transparent electrode and corresponding to the transparent electrode, which is formed as a film on the surface of a display panel (5); and a support layer (2) having a plurality of support lines (2a) provided to one surface (1a) of the mask layer (1) traversing the opening pattern (4). The arraying pitch of the support lines (2a) of the support layer (2) has dimensions able to suppress the occurrence of diffraction fringes or moire fringes stemming from the shadows of the support lines (2a) transferred onto the transparent electrode as film thickness unevenness. 本发明是类具有细晶粒组织的新的6XXX系列的高强度铝合金，以及制备和挤出的方法。本发明的铝合金包含约0.90重量％至约1.2重量％的硅、至多约0.5重量％的铁、约0.05重量％至约0.3重量％的铜、至多约0.75重量％的锰、约0.70重量％至约1.0重量％的镁、至多约0.25重量％的铬、至多约0.05重量％的锌、至多约0.1重量％的钛，余量基本上由铝组成。铸造并均质化所述合金，然后挤出、淬火和人工时效，以在最终铝产品内产生细晶粒结晶，其表现出优异的抗拉强度和伸长率特性。