A semiconductor device and a fabrication method thereof

• Main Authors: CHING KUONG, LEUNG YING-KEUNG, TSAI CHING-WEI
• Format: Patent
• Language: Chinese; English
• Published: 01.03.2017
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

The invention discloses a s semiconductor device and a fabrication method thereof. The method of semiconductor fabrication that includes providing a plurality of fins extending from a substrate is described. Each of the plurality of fins has a top surface and two opposing lateral sidewalls. A gate s...