Method to filter macro particles in a cathodic arc physical vapor deposition (pvd), in vacuum

• Main Author: UKHANOV SERGEY
• Format: Patent
• Language: Chinese; English
• Published: 22.02.2017
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

A method to filter macro particles in a cathodic arc physical vapor deposition (PVD) in vacuum is described, said method comprising the step of evaporating a material from a solid source (1) by means of application of the arc on the source, forming a plasma comprising electrons, micro particles (vapor) and ions of evaporated material, together with macro particles larger in size than the micro particles and ions. The arc is moved on the source at a speed Vcs (superficial speed) at which the electrons, the micro particles and the ions of material evaporated at a point P2 deviate, from a path towards a substrate (2) to be coated facing the source, the macro particles formed at a point P1 previously passed over by the arc, so as to self-clean the plasma of the macro particles and allow condensation of only the cleaned plasma on the substrate. 描述了在阴极电弧物理气相沉积(PVD)中真空过滤宏观粒子的方法，所述方法包括以下步骤：借助于对固体源施加电弧而蒸发来自所述固体源(1)的材料，形成包括蒸发材料的电子、微观粒子(蒸汽)和离子的等离子体，以及比所述微观粒子和离子尺寸更大的宏观粒子。所述电弧以速率V(表面速率)在所述源上移动，以所述速率V，在点P处蒸发的材料的电子、微观粒子和离子，