Method for preparing copper film through controlled atmosphere cold spraying

• Main Authors: ZHANG SHANLIN, MA KAI, LI CHANGJIU, YANG GUANJUN, LI CHENGXIN
• Format: Patent
• Language: Chinese; English
• Published: 01.02.2017
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The invention discloses a method for preparing a copper film through controlled atmosphere cold spraying. The method comprises the steps that firstly, original copper powder is conveyed into a powder oxygen content control unit, copper oxide on the surfaces of copper powder particles is reduced into copper, and the oxygen content of the copper powder is reduced; secondly, the copper powder treated through the powder oxygen content control unit is conveyed into a powder granularity control and powder feeding unit, the input copper powder is scattered and screened, and the granularity of the output copper powder particles is controlled within the set range; thirdly, the copper powder treated in the second step is conveyed into a cold spraying nozzle in a controlled oxygen partial pressure cavity; and fourthly, the speed and temperature of the copper powder particles are regulated and controlled through a gas pressure, flow and temperature control unit, and the copper powder particles in the controlled oxygen pa