Estimating deformation of a patterning device and/or a change in its position

• Main Authors: VAN DER WIELEN ADRIANUS MARTINUS, DELMASTRO PETER A, WARD CHRISTOPHER CHARLES, MOEST BEARRACH, ONVLEE JOHANNES
• Format: Patent
• Language: Chinese; English
• Published: 23.11.2016
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

A system and method are provided for determining deformation of a patterning device and/or shift position of the patterning device relative. The system includes a first sensing sub-system that measures respective positions of a plurality of reference marks on the patterning device, and a second sensing sub-system that measures positions of the edge of the patterning device relative to the support. The system further includes a controller to determine an absolute position of the patterned portion and change in the absolute position based on measured respective positions of marks on the patterning device, determine a change in a relative position of the edge of the patterned device based on the measured edge positions, and estimate a change in a position of the patterning device relative to the support and a change in a pattern distortion of the patterned portion of the patterning device over a time period. 为确定图案形成装置的变形和/或图案形成装置的偏移位置提供了种系统和方法。所述系统包括：第感测子系统，所述第感测子系统测量图案形成装置上的多个参考标记的各自的位置；和第二感测子系统，所述第二感测子系统测量图案形成