Application of highly sulfated seaweed polysaccharide to post-basking repair mask

The invention provides application of highly sulfated seaweed polysaccharide to a post-basking repair mask. The application means that the highly sulfated seaweed polysaccharide can be applied to preparation of the post-basking repair mask. Raw materials of the post-basking repair mask are all natur...

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Bibliographic Details
Main Authors NIU XIZHEN, WANG JING, ZHANG QUANBIN, ZHANG HONG
Format Patent
LanguageChinese
English
Published 26.10.2016
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Summary:The invention provides application of highly sulfated seaweed polysaccharide to a post-basking repair mask. The application means that the highly sulfated seaweed polysaccharide can be applied to preparation of the post-basking repair mask. Raw materials of the post-basking repair mask are all natural materials, non-toxic, and free of stimulation and side effects; the highly sulfated seaweed polysaccharide is relatively high in effects of moisture absorption, moisture preservation, oxidation resistance and inflammatory resistance, can provide sufficient moisture for skin, can form a moisturizing membrane to retain moisture, and can calm exhausted and rough skin, remove superoxide anion free radicals in the skin, and alleviate skin inflammation. The mask can be applied to post-basking facial skin care. 本发明提供了种高硫酸化的海藻多糖在晒后修复面膜中的应用。所述高硫酸化的海藻多糖在晒后修复面膜中的应用是指该高硫酸化的海藻多糖可以应用于制备晒后修复面膜。本发明面膜使用的原料均为天然材料,无毒、无刺激、无副作用;高硫酸化的海藻多糖具有较好的吸湿保湿、抗氧化和抗炎作用,可以为肌肤提供充足水分,并且能形成锁水膜保持水分,同时可以镇静疲劳、粗糙肌肤,清除肌肤中的超氧阴离子自由基,减轻皮肤炎症。该面膜可以应用于太阳暴晒后面部肌肤
Bibliography:Application Number: CN20161575483