Method for manufacturing film formation mask and film formation mask

• Main Author: MIZUMURA MICHINOBU
• Format: Patent
• Language: Chinese; English
• Published: 14.09.2016
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; CLADDING OR PLATING BY SOLDERING OR WELDING; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR; METALLURGY; PERFORMING OPERATIONS; SOLDERING OR UNSOLDERING; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TRANSPORTING; WELDING; WORKING BY LASER BEAM

The present invention provides a method for manufacturing a film formation mask and a film formation mask. The present invention is a method for manufacturing a film formation mask having a structure in which a resin film layer (1) provided with an opening pattern (4) of a previously determined specified pattern and a magnetic metal material layer (2) provided with spaces (7) of a size that can accommodate the opening pattern (4) are laminated. The opening pattern (4) is formed by irradiating laser light from both surfaces of portions of the film layer (1) corresponding to the spaces (7) to pierce the film layer (2). 本发明提供成膜掩膜的制造方法以及成膜掩膜。成膜掩膜的制造方法制造将设有预先决定的规定形状的开口图案(4)的树脂制的薄膜层(1)和设有能够包含上述开口图案(4)的大小的缝隙(7)的磁性金属材料层(2)相层叠的构造的成膜掩膜，上述开口图案(4)通过向薄膜层(1)的与上述缝隙(7)对应的部分从两面侧照射激光使上述薄膜层(2)贯通而形成。