Etchant Composition And Method Of Forming A Transparant Electrode

• Main Authors: KIM, Bo-Hyeong, YU, In-Ho, KWON, Min-Jeong
• Format: Patent
• Language: Chinese; English
• Published: 24.08.2016
• Subjects: ADHESIVES; BASIC ELECTRIC ELEMENTS; CABLES; CHEMISTRY; CONDUCTORS; DYES; ELECTRICITY; INSULATORS; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; PAINTS; POLISHES; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES

The invention discloses an etchant composition for etching an indium oxide layer and a method for forming a transparant electrode. The etchant composition comprises 5-10wt% of nitric acid, 0.5-5wt% of sulfonyl chloride compounds, 0.1-5wt% of cyclammonium compounds, and balance being water. A thick i...