Lithographic apparatus and device manufacturing method

• Main Authors: BREUKERS MARCUS JOSEPH ELISABETH GODFRIED, BUTLER HANS, HEERTJES MARCEL FRANCOIS
• Format: Patent
• Language: Chinese; English
• Published: 03.08.2016
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

The invention discloses a lithographic apparatus and a device manufacturing method. A control device for controlling a synchronous positioning of a multi-body system is described, the control device comprising: an input for receiving a first error signal (ers) representing a difference between a desired position of a first body (MT) of the multi-body system and a measured position of the first body and a second error signal (ews) representing a difference between a desired position of a second body (WT) of the multi-body system and a measured position of the second body; the control device being configured to: determine a primary first drive signal (Fr1) for driving a positioning device configured to drive the first body, based on the first error signal (e rs); determine a primary second drive signal (Fw1) for driving a positioning device configured to drive the second body, based on the second error signal (ews); determine a secondary first drive signal (Fr2) for driving the positioning device configured to