Layer system of a transparent substrate and method for producing a layer system

• Main Authors: GUNTER GRABOSCH, KROYER THOMAS, KLEIDEITER GERD, SCHREIBER UDO, GRAF WOLFGANG
• Format: Patent
• Language: Chinese; English
• Published: 06.07.2016
• Subjects: CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS; CHEMISTRY; GLASS; JOINING GLASS TO GLASS OR OTHER MATERIALS; METALLURGY; MINERAL OR SLAG WOOL; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS; SURFACE TREATMENT OF GLASS

The invention relates to a layer system of a transparent substrate (100) reflecting an infrared radiation, comprising, arranged in this order: a first dialectic layer (D1) arranged on the transparent substrate (100); a second dialectic layer (D2) arranged on the first dialectic layer (D1); a first metal layer system (MS1) comprising, in this order: a first metal layer (M1), preferably made of or comprising Ag; a first blocking layer (B1). A dielectric barrier cover layer system (BDS) is provided. The first dielectric layer (D1) is made of or comprises SiO2, and the second dielectric layer (D2) is made of or comprises TiO2 or Al2O3, or the first dielectric layer (D1) is made of or comprises Al2O3 and the second dielectric layer (D2) is made of or comprises TiO2. In the method for producing an infrared reflective layer system on a provided transparent substrate (100) according to the invention, at least one of the applied individual layers is applied by sputtering a ceramic target or by reactive sputtering. 本发明