Vapor deposition support plate and vapor deposition device

• Main Authors: WAN XIANG, SHANGGUAN RONGGANG, SUN LI, WANG XINXIN, MA KAIHONG
• Format: Patent
• Language: Chinese; English
• Published: 06.07.2016
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The invention discloses a vapor deposition support plate and a vapor deposition device and belongs to the field of vapor deposition equipment. The vapor deposition support plate comprises a support plate body and a viscosity reduction part. The viscosity reduction part is arranged on the support plate body. An OLED substrate is fixed to the surface of one side of the support plate body through sensitive glue. The viscosity reduction part is used for reducing the viscosity of the sensitive glue after completion of vapor deposition. According to the vapor deposition support plate, the viscosity reduction part is used for reducing the viscosity of the sensitive glue after completion of vapor deposition, so that the OLED substrate is separated from the vapor deposition support plate, and the situation that deformation and fragments happen to the OLED substrate or the OLED substrate is totally broken due to the fact that the vapor deposition support plate and the OLED substrate are separated by external force is a