Imprint apparatus and method of manufacturing article

• Main Author: NARIOKA SHINTARO
• Format: Patent
• Language: Chinese; English
• Published: 08.06.2016
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES; MATERIALS THEREFOR; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; NANOTECHNOLOGY; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; TRANSPORTING

The present invention provides an imprint apparatus and a method of manufacturing an article. The imprint apparatus performs imprint processing of forming a pattern of an imprint material on a substrate using a mold. The apparatus includes a chuck configured to hold the mold, a head configured to support the chuck to be able to drive the chuck, the head being fixed to a base, a plate member configured to be arranged between the base and the substrate so as to surround the chuck, and a first supply unit configured to supply a first gas to a first space so as to form an air flow from the first space between the plate member and the substrate toward a second space outside the first space. 本发明提供种压印装置及物品的制造方法。所述压印装置进行利用模具将基板上的压印材料形成图案的压印处理，所述压印装置包括：卡盘，其被构造为保持所述模具；头部，其被构造为支承所述卡盘以能够驱动所述卡盘，所述头部被固定到基座；板构件，其被构造为以围绕所述卡盘的方式布置在所述基座与所述基板之间；以及第供给单元，其被构造为向第空间供给第气体，以形成从所述板构件与所述基板之间的第空间朝向所述第空间外部的第二空间的气流。