Film resistor and preparation method thereof

The invention discloses a film resistor and a preparation method thereof. The film resistor comprises an insulation substrate of which the surface forms two surface electrodes at an interval, a resistor layer which is formed on the surface of the insulation substrate, is connected to the two surface...

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Bibliographic Details
Main Authors YANG ZEMING, LI GUOGUI, LIN RUIFEN, ZHANG YUANSHENG, FAN WENXIN, YANG XIAOPING, LIN BOLIU
Format Patent
LanguageEnglish
Published 24.02.2016
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRICITY
RESISTORS
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Summary:The invention discloses a film resistor and a preparation method thereof. The film resistor comprises an insulation substrate of which the surface forms two surface electrodes at an interval, a resistor layer which is formed on the surface of the insulation substrate, is connected to the two surface electrodes and covers a part of the surfaces of the surface electrodes, a film dielectric layer which covers the surface of the resistor layer and comprises at least one of silica, silicon nitride, tantalum-silicon alloy, titanium-silicon alloy and aluminum-silicon alloy, and a protection layer which completely covers the surface of the film dielectric layer and extends to the insulation substrate and surface electrode surfaces. The film resistor has good moisture resistance.
Bibliography:Application Number: CN201510781228