Methods and active materials for reducing halide concentration in gas streams

The present disclosure relates generally to methods and active materials for purifying gas streams containing halide as a contaminant, for example, in amounts as low as parts-per-million (ppm) or even parts-per-billion (ppb). In one aspect of the invention, an active material includes (a) one or mor...

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Bibliographic Details
Main Authors WANG JUSTIN X, SOKHEY SIMRAN K, CAI YEPING, SPENCER JASON E
Format Patent
LanguageEnglish
Published 03.02.2016
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Summary:The present disclosure relates generally to methods and active materials for purifying gas streams containing halide as a contaminant, for example, in amounts as low as parts-per-million (ppm) or even parts-per-billion (ppb). In one aspect of the invention, an active material includes (a) one or more first metals each present as a metal oxide or metal hydroxide, the first metals being selected from the group consisting of iron, cobalt, nickel, copper, ruthenium, rhodium, palladium, silver, osmium, iridium, platinum, and gold; and (b) one or more second metals each present as a metal oxide or metal hydroxide, the one or more second metals being selected from the group consisting of alkali metals, alkaline earth metals, scandium, yttrium, titanium, zirconium, hafnium, vanadium, niobium, tantalum, chromium, molybdenum, tungsten, manganese, technetium, and rhenium.
Bibliography:Application Number: CN201480032054