Preparation method for COA-type array substrate and COA-type array substrate

The invention provides a preparation method for a COA-type array substrate and the COA-type array substrate. According to the preparation method for the COA-type array substrate, a quantum dot color filter film comprising a red filter layer, a green filter layer and a blue filter layer is formed on...

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Bibliographic Details
Main Author DENG WEIJIA
Format Patent
LanguageEnglish
Published 20.01.2016
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Summary:The invention provides a preparation method for a COA-type array substrate and the COA-type array substrate. According to the preparation method for the COA-type array substrate, a quantum dot color filter film comprising a red filter layer, a green filter layer and a blue filter layer is formed on a TFT substrate with an electrochemical deposition method through pixel electrode patterns on the TFT substrate and the property that the solubility of chitosan changes along with changes of the pH value, quantum dots are dispersed in an electrolyte solution before the film is formed, no other property change occurs before and after the film is formed except that the quantum dot concentration of the electrolyte solution is reduced, the electrolyte solution still can be continuously used after the quantum dots are supplemented, and therefore zero waste of the quantum dots can be achieved. Compared with an existing color filter film preparation method, a high-temperature procedure does not need to be used, and the quantum dot utilization rate is effectively increased; meanwhile, two to three times of a photolithography technology can be omitted, and therefore the cost is reduced and the environment is protected.
Bibliography:Application Number: CN201510809106