Calibration of an RF processing system

Apparatuses and methods are provided for processing an object in a cavity. The apparatuses include at least one radio frequency (RF) energy supply component configured to supply RF energy for application to one or more radiating elements configured to emit RF radiation in response to the applied RF...

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Bibliographic Details
Main Authors CHAIMOV ITZHAK, LIBMAN AVNER
Format Patent
LanguageEnglish
Published 06.01.2016
Subjects
ELECTRIC HEATING
ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
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Summary:Apparatuses and methods are provided for processing an object in a cavity. The apparatuses include at least one radio frequency (RF) energy supply component configured to supply RF energy for application to one or more radiating elements configured to emit RF radiation in response to the applied RF energy. In some embodiments, a provided apparatus also includes a memory storing a set of coefficients associated with the RF energy supply component; and a processor configured to receive feedback in response to emission of RF radiation by the one or more radiating elements and control application of RF energy to one or more of the radiating elements based on the feedback and the set of coefficients.
Bibliography:Application Number: CN201480029082