Monolithically isled back contact back junction solar cells using bulk wafers

According to one aspect of the disclosed subject matter, a method for forming a monolithically isled back contact back junction solar cell using bulk wafers is provided. Emitter and base contact regions are formed on a backside of a semiconductor wafer having a light receiving frontside and a backsi...

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Bibliographic Details
Main Authors WINGERT MICHAEL, KAPUR PAWAN, MOSLEHI MEHRDAD M, KRAMER KARL-JOSEF
Format Patent
LanguageEnglish
Published 02.12.2015
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Summary:According to one aspect of the disclosed subject matter, a method for forming a monolithically isled back contact back junction solar cell using bulk wafers is provided. Emitter and base contact regions are formed on a backside of a semiconductor wafer having a light receiving frontside and a backside opposite said frontside. A first level contact metallization is formed on the wafer backside and an electrically insulating backplane is attached to the semiconductor wafer backside. Isolation trenches are formed in the semiconductor wafer patterning the semiconductor wafer into a plurality of electrically isolated isles and the semiconductor wafer is thinned. A metallization structure is formed on the electrically insulating backplane electrically connecting the plurality of isles.
Bibliography:Application Number: CN2014820464