Positioning Apparatus for Electron Beam

• Main Authors: JAN BERK, THOMAS WEIDINGER
• Format: Patent
• Language: English
• Published: 25.11.2015
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; X-RAY TECHNIQUE

The invention relates to a positioning apparatus for an electron beam. The positioning apparatus includes: a first DC voltage circuit having a high potential difference and a second DC voltage circuit having a smaller potential difference, having in each case a first potential level and a second potential level, and a deflection module, which has two inputs and at least one deflection coil, wherein the at least one deflection coil is connected between the two input ends of the deflection module. The first potential level of the first DC voltage circuit is connected switchably to the input end of the deflection module and as a result a first switching path is formed, and the second potential level of the first DC voltage circuit is connected to the other input end of the deflection module. The first potential level of the second DC voltage circuit is connected switchably to the input end of the deflection module and, as a result, a second switching path is formed, which is switchable separately from the first switching path. The second potential level of the second DC voltage circuit is connected to the other input end of the deflection module. The invention also relates to a method for actuating, by pulse width modulation, the positioning apparatus.