Bearing device, reaction chamber and semiconductor machining equipment

• Main Author: WU XUEWEI
• Format: Patent
• Language: English
• Published: 25.11.2015
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The intention provides a bearing device, a reaction chamber and semiconductor machining equipment. The bearing device comprises a tray, a base and a pressing ring, wherein the tray is used for bearing a workpiece to be machined; the base is used for bearing the tray; the pressing ring is used for fi...