Extreme ultraviolet (EUV) multilayer-film carbon pollution experiment device

• Main Authors: LU QIPENG, WANG YI, GONG XUEPENG, PENG ZHONGQI
• Format: Patent
• Language: English
• Published: 26.08.2015
• Subjects: INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES; MEASURING; PHYSICS; TESTING

The invention relates to an EUV multilayer-film carbon pollution experiment device, belongs to the technical field of semiconductors and solves the technical problems that EUV multilayer-film carbon pollution experiment devices can only detect single experiment results and are low in experiment reliability and comparability. The device comprises a focusing cavity, a first gate valve, a transition vacuum valve, an angle valve, an exposure vacuum cavity, a light filter, a mass spectrometer, a pollution gas flow control unit, a first vacuum pump, a three-dimensional adjusting mechanism, a sample support fixing mechanism, an EUV photodiode, a second gate valve, a preparation vacuum cavity, a sample feeding mechanism, a sample support, a sample delivery mechanism and a second vacuum pump. By means of the device, focusing exposure and out-of-focus exposure of samples and different-position difference exposure of samples can be completed, vacuum in the device cannot be destroyed, and the experiment reliability is high.