A composition and method for treating substrates

The present invention relates to a composition and a method for treating substrates, such as fabrics; particularly for improved stain removal and better cleaning upon the subsequent wash and also for reduced re-deposition of dirt. It is therefore an object of the present invention to provide improve...

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Bibliographic Details
Main Authors SARKAR ARPITA, PRAMANIK AMITAVA, DUTTA KINGSHUK, PERINCHEERY ARAVINDAKSHAN
Format Patent
LanguageEnglish
Published 08.07.2015
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Summary:The present invention relates to a composition and a method for treating substrates, such as fabrics; particularly for improved stain removal and better cleaning upon the subsequent wash and also for reduced re-deposition of dirt. It is therefore an object of the present invention to provide improved aqueous/bleachable, oily or particulate stain removal. It is a further object of the present invention to provide improved cleaning upon subsequent wash and reduce re-deposition of dirt. It has been found that improved aqueous/bleachable, oily or particulate stain removal and reduced redeposition of dirt can be achieved by depositing a surfactant complex of an anionic and a cationic surfactant, a non-ionic polymer and a chelating agent onto the fabric.
Bibliography:Application Number: CN201380058216