Wet etching equipment

• Main Author: XUE DAPENG
• Format: Patent
• Language: English
• Published: 03.06.2015
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

The invention provides wet etching equipment. The wet etching equipment has a function of removing etching liquid crystal outside an etching chamber, and comprises the etching chamber and a spray pipe, wherein a film to be etched is etched through etching liquor inside the etching chamber; an etching chamber inlet is formed in the front end of the etching chamber; an etching chamber outlet is formed in the rear end of the etching chamber; the spray pipe is arranged below the etching chamber inlet and/or the etching chamber outlet, and can be towards to the upper part to spray liquid, so as to clean etching liquid crystal formed at the etching chamber inlet and/or the etching chamber outlet. The wet etching equipment adopts the spray pipe to spray the etching chamber inlet and the etching chamber outlet, can effectively remove a large amount of etching liquid crystal produced at the etching chamber inlet and the etching chamber outlet, improves the equipment operation ratio, cleanness and product quality, and solves a major problem in a TFT base substrate manufacture technology.