Block copolymer composition

The invention provides a block copolymer composition, which comprises an A-B diblock copolymer and an A-B-A triblock copolymer, wherein A is vinyl aromatic hydrocarbon polymer, and B is conjugated dienepolymer. A-B diblock copolymer has a first peak molecular weight and a second peak molecular weigh...

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Bibliographic Details
Main Authors GUO HONG-RU, LEE CHIHNG
Format Patent
LanguageEnglish
Published 27.05.2015
Subjects
ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE
ADHESIVES
CHEMISTRY
COMPOSITIONS BASED THEREON
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
DYES
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL
ORGANIC MACROMOLECULAR COMPOUNDS
PAINTS
POLISHES
THEIR PREPARATION OR CHEMICAL WORKING-UP
USE OF MATERIALS AS ADHESIVES
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Summary:The invention provides a block copolymer composition, which comprises an A-B diblock copolymer and an A-B-A triblock copolymer, wherein A is vinyl aromatic hydrocarbon polymer, and B is conjugated dienepolymer. A-B diblock copolymer has a first peak molecular weight and a second peak molecular weight, wherein the first peak molecular weight is 80-130 thousand, and the second peak molecular weight is 170-270 thousand.
Bibliography:Application Number: CN2014192379