Silicon heterojunction solar cell with electroplating electrode and manufacturing method thereof

• Main Authors: DING JIANGBO, LI LIWEI, WU BO, GUO TIE, CHEN GUANGYU, YANG RONG, MENG YUAN
• Format: Patent
• Language: English
• Published: 22.04.2015
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

The embodiment of the invention discloses a silicon heterojunction solar cell with an electroplating electrode and a manufacturing method thereof. The method comprises the steps that a metal seed layer is formed on the surface, where a grid needs to be manufactured, of a cell substrate; a silk-screen printing ink process is used for forming an ink grid line groove pattern on the surface of the metal seed layer; after a preset time interval, the ink grid line groove pattern is cured; the ink grid line groove pattern is used as a mask film, an electroplating process is used for depositing a composite metal layer; the ink grid line groove pattern and the part, which is not in contact with the composite metal layer, of the metal seed layer is removed. The implementation mode for forming the ink grid line groove pattern by the silk-screen printing ink process is simple and controllable, moreover, ink can be removed easily, and the manufacturing technology is simple. In the curing process, the ink can be evenly expanded and deformed, the width of an opening of the obtained ink grid line groove pattern is small, the depth-width ratio of a formed metal grid line is large, the light shading area is small, and the efficiency of the silicon heterojunction solar cell with the electroplating electrode is improved.