Manufacturing method of high-precision mask

• Main Authors: LIU YAWEI, WU CONGYUAN
• Format: Patent
• Language: English
• Published: 22.04.2015
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The invention provides a manufacturing method of a high-precision mask, which comprises the following steps: thinning the perforated region of a mask substrate to a thickness penetrable for laser by using a half-etching process, applying tensile force to the periphery of the mask substrate to flatten the surface, welding the mask substrate to a mask frame, and cutting the mask plate with a laser to obtain a hole with required pattern. The lasing beam with the diameter of 1 micrometer is utilized to perforate the mask substrate so as to enhance the perforation precision of the mask and the perforation position accuracy, thereby more accurately manufacturing the mask plate with designed perforation size. The lasing beam with the diameter of 1 micrometer can be utilized to make a hole with minimal linewidth in the mask plate, thereby enhancing the resolution of the display device. Besides, the equipment cost required by production is lowered, thereby obviously lowering the production cost of the mask. The manufacturing process is shortened, thereby greatly enhancing the production efficiency of the mask.