Novel thick film photoresist coating method

• Main Authors: ZHAO XULONG, BAYINHEXIGE, JIANG YANXIU, WU NA, YANG SHUO, LI WENHAO, TAN XIN
• Format: Patent
• Language: English
• Published: 08.04.2015
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

The invention discloses a novel thick film photoresist coating method and belongs to the technical field of photoetching, in order to solve the problem that the thick photoresist coating with the thickness of hundreds of microns cannot be performed in the prior art. According to the invention, the method comprises the following steps that a first adjusting screw group is arranged on a bearing platform; the bearing platform is leveled by adjusting the first adjusting screw group; the levelness of the bearing platform is detected by using a first levelness detector; an optical substrate bearing table is arranged on the bearing platform; a second adjusting screw group is arranged on the optical substrate bearing table; the levelness of the optical substrate bearing table is detected by using a second levelness detector; the distance between a photoresist coating blade and an optical substrate is adjusted; a linear motor stator is arranged on the bearing platform, a linear motor rotor is connected with a second push-pull rod, a universal bearing and a first push-pull rod; the first push-pull rod is vertically connected with a photoresist coating moving mechanism, and the push-pull rods are driven to move by virtue of the movement of the linear motor rotor, so that the photoresist coating moving mechanism is moved; and moreover, the photoresist coating blade is driven to move by virtue of the photoresist coating moving mechanism, and the photoresist coats the surface of the optical substrate.