Drawing method and drawing device

• Main Author: KAZUHIRO NAKAI
• Format: Patent
• Language: English
• Published: 25.03.2015
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

The present invention provides a drawing method and a drawing device. The drawing method comprises detecting a plurality of positions of alignment marks of a plurality of chips arranged on a substrate and calculating a position shift amount from a standard position. If linear displacement between re...