Drawing method and drawing device

The present invention provides a drawing method and a drawing device. The drawing method comprises detecting a plurality of positions of alignment marks of a plurality of chips arranged on a substrate and calculating a position shift amount from a standard position. If linear displacement between re...

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Bibliographic Details
Main Author KAZUHIRO NAKAI
Format Patent
LanguageEnglish
Published 25.03.2015
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:The present invention provides a drawing method and a drawing device. The drawing method comprises detecting a plurality of positions of alignment marks of a plurality of chips arranged on a substrate and calculating a position shift amount from a standard position. If linear displacement between relative positions of the alignment marks is small, a stage moves only an obtained movement amounted to adjust a drawing position. In the case of non-linear displacement, positions of other alignment marks are estimated and actually measured; if the positional deviation between an estimated position and an actual position is small, raster data is rectified; and if the positional deviation between the estimated position and the actual position is large, positions of the chips are obtained through detection of the alignment marks, and raster image processing is performed again.
Bibliography:Application Number: CN201410449209