种石墨烯纳米带-铝基超级电容器集电极的制备方法

• Format: Patent
• Language: Chinese
• Published: 12.04.2017
• Subjects: BASIC ELECTRIC ELEMENTS; CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES ORLIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRICITY; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGYGENERATION, TRANSMISSION OR DISTRIBUTION; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS; TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINSTCLIMATE CHANGE

种石墨烯纳米带-铝基超级电容器集电极的制备方法，本发明涉及电极的制备方法。本发明要解决现有石墨烯纳米带制备方法存在合成过程复杂，结构缺陷多，表面含氧官能团很多，不能充分发挥出石墨烯纳米带优异性能，且比表面积低和电学性能差的问题。方法：制备表面覆有催化剂颗粒的Al基底材料，并置于等离子体增强化学气相沉积真空装置中，通入氢气并调节压强，在氢气气氛中升温；达到定温度后，通入氩气，调节氩气和氢气的流量、压强、射频功率，进行刻蚀处理段时间后，关闭氩气；最后通入甲烷和氢气，调节气体的流量、压强及射频功率，进行沉积。本发明用于种石墨烯纳米带-铝基超级电容器集电极的制备。 The invention relates to preparing methods of electrodes, in particular to a preparing method of a graphene nanoribbon and aluminum-based supercapacitor collector electrode. The preparing method aims at solving the problems that an existing graphene nanoribbon preparing method is complex in synthetic process, structure defects are many, surface oxygen-containing functional groups are many, the excellent performance of the graphene nanoribbon cannot be fully played, the specific surface area is small, and the electrical property is poor. The preparing method comprises the steps that an Al substrate material with the surface covered with catalyst grains is prepared and put in a plasma enhancing chemical vapor deposition vacuum device,