Exhaust flow spreading baffle-riser to optimize remote plasma window clean

The present invention relates to an exhaust flow spreading baffle-riser to optimize remote plasma window clean. Porogen accumulation in a UV-cure chamber may be reduced by removing outgassed porogen by flowing a purge gas across a window through which a wafer is exposed to UV light. Porogens in the...

Full description

Saved in:
Bibliographic Details
Main Authors LAU, STEPHEN YU-HONG, GYTRI, LISA MARIE, LEE, JAMES FOREST
Format Patent
LanguageEnglish
Published 18.03.2015
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
Online AccessGet full text

Cover

More Information
Summary:The present invention relates to an exhaust flow spreading baffle-riser to optimize remote plasma window clean. Porogen accumulation in a UV-cure chamber may be reduced by removing outgassed porogen by flowing a purge gas across a window through which a wafer is exposed to UV light. Porogens in the purge gas stream may, as they flow through the chamber and into an exhaust baffle, deposit on surfaces within the chamber, including on the exhaust baffle. The exhaust baffle may have particular features that cause such porogen deposition to be more uniformly distributed across the exhaust baffle, thus reducing the amount of time that may be required to fully clean the baffle of accumulated porogens during a cleaning process.
Bibliography:Application Number: CN201410421492