Method for coating photoresist on surface of hydrophobic insulating layer

The invention discloses a method for coating a photoresist on the surface of a hydrophobic insulating layer. The method comprises the steps of directly coating a photoresist solution with high viscosity on the surface of the hydrophobic insulating layer through a coil bar coating method; carrying ou...

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Bibliographic Details
Main Authors JIN MINGLIANG, SHUI LINGLING, ZHOU GUOFU, WEI BIMING, ZHANG MAORONG
Format Patent
LanguageEnglish
Published 11.03.2015
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:The invention discloses a method for coating a photoresist on the surface of a hydrophobic insulating layer. The method comprises the steps of directly coating a photoresist solution with high viscosity on the surface of the hydrophobic insulating layer through a coil bar coating method; carrying out vacuum heating which is a special heat treatment method; strictly controlling temperature rise procedures, wherein the photoresist coating is good in viscosity, the bad viscosity phenomena of peeling, separating and the like cannot be caused on the coating in a developing process, and the good quality of a photolithography technique can be realized. The method provided by the invention can be used for electrowetting display, microflow control chip and other fields.
Bibliography:Application Number: CN20141665467