Micro-arc oxidation device for improving film thickness evenness and energy utilizing rate based on separate type compensation cathode

• Main Authors: MA TIANYU, BI YANJUN, QU WEIFENG, TIAN QINWEN, LI MUQIN, LIU ZHONGZHOU
• Format: Patent
• Language: English
• Published: 11.03.2015
• Subjects: APPARATUS THEREFOR; CHEMISTRY; ELECTROFORMING; ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; METALLURGY; PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS

The invention provides a micro-arc oxidation device for improving film thickness evenness and energy utilizing rate based on a separate type compensation cathode, relates to the field of workpiece surface micro-arc oxidation, and solves the problem of the existing micro-arc oxidation technology that uneven workpiece oxide film thickness and electrolyte equivalent impedance result in low energy utilizing rate. An upper cathode frame is of a U-shaped structure and is erected on a micro-arc tank, array through holes are formed in the bottom plate of the upper cathode frame, an insulating frame is fixed to the upper surface of the upper cathode frame through bolts, an anode rod is a cuboid long rod, the two ends of the anode rod are fixed on the insulating frame through bolts, one end of a workpiece suspending rod is positioned in the micro-arc tank and provided with a hook, the other end of the workpiece suspending rod penetrates through the through hole in the bottom plate of the upper cathode frame and is fixed on the anode rod through an anode clamp, a hook is arranged at one end of a compensation cathode suspending rod, the compensation cathode suspending rod is erected on the bottom plate of the upper cathode frame through the hook, and a compensation cathode plate is fixedly connected with the other end of the compensation cathode suspending rod. The micro-arc oxidation device is suitable for micro-arc oxidation.