Lithographic apparatus
A lithographic apparatus injects gas between a reticle (MA) and reticle blades (REB-X, REB-Y) to protect the reticle from contamination. The gas may be injected either into the space defined between the reticle and the closest pair of reticle blades, or into the space defined between the two pairs o...
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Main Authors | , , , , , |
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Format | Patent |
Language | English |
Published |
04.02.2015
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Subjects | |
Online Access | Get full text |
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Summary: | A lithographic apparatus injects gas between a reticle (MA) and reticle blades (REB-X, REB-Y) to protect the reticle from contamination. The gas may be injected either into the space defined between the reticle and the closest pair of reticle blades, or into the space defined between the two pairs of reticle blades. |
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Bibliography: | Application Number: CN201380013882 |