Apparatus for processing fragile substrate using multi lasers and method thereof
Disclosed herein is an apparatus for processing a fragile substrate using multi lasers. The apparatus comprises a picosecond laser device which generates a first laser pulse with a picosecond-level pulse width; a femtosecond laser device which generates a second laser pulse with a femtosecond-level...
Saved in:
Main Authors | , , |
---|---|
Format | Patent |
Language | English |
Published |
21.01.2015
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | Disclosed herein is an apparatus for processing a fragile substrate using multi lasers. The apparatus comprises a picosecond laser device which generates a first laser pulse with a picosecond-level pulse width; a femtosecond laser device which generates a second laser pulse with a femtosecond-level pulse width; a laser controller which calculates a time difference between the first and second laser pulses, delaying the first or second laser pulse according to the time difference, and outputting the first and second laser pulses as third and fourth laser pulses respectively; a reflecting mirror which changes the direction of the third or fourth laser pulse; and a lens which allows the third and fourth laser pulses to pass through and enables the third and fourth laser pulses to be overlapped. |
---|---|
Bibliography: | Application Number: CN201410277053 |