Reactor and process for producing high-purity silicon
A reactor for producing silicon by means of thermal decomposition of a silicon-containing compound on silicon rods heated to a high temperature, which comprises a reactor bottom and an upper reactor part mounted thereon which together enclose an interior reactor space in which the thermal decomposit...
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Main Author | |
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Format | Patent |
Language | Chinese English |
Published |
24.12.2014
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Subjects | |
Online Access | Get full text |
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Summary: | A reactor for producing silicon by means of thermal decomposition of a silicon-containing compound on silicon rods heated to a high temperature, which comprises a reactor bottom and an upper reactor part mounted thereon which together enclose an interior reactor space in which the thermal decomposition occurs, where the reactor bottom has holders in which the silicon rods are fixed, is described. The reactor is characterized in that the holders on the reactor bottom form a pattern made up of hexagons and/or in that the interior reactor space is divided by a cylindrical dividing wall into two subregions, a central, preferably cylindrical inner region in which the silicon rods are arranged and a preferably annular outer region radially enclosing the inner region, where the subregions are open at the top or connected to one another by openings in the dividing wall. Furthermore, a process for producing silicon which can be carried out in such a reactor is described. |
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Bibliography: | Application Number: CN2012870481 |