Mask plate and exposure method

The embodiment of the invention discloses a mask plate and an exposure method and relates to the technical field of display. By adopting the mask plate, a multilayer structure can be formed. The mask plate comprises at least two overlapped sub-mask plates, wherein each sub-mask plate comprises shiel...

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Bibliographic Details
Main Authors PIAO XIANGZHEN, WANG BAOQIANG
Format Patent
LanguageChinese
English
Published 26.11.2014
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:The embodiment of the invention discloses a mask plate and an exposure method and relates to the technical field of display. By adopting the mask plate, a multilayer structure can be formed. The mask plate comprises at least two overlapped sub-mask plates, wherein each sub-mask plate comprises shielding patterns and light transmitting patterns; and the vertical projections of all the shielding patterns on the mask plate are not overlapped.
Bibliography:Application Number: CN20141384302