Preparation, purification and use of high-X diblock copolymers

This invention relates to the preparation and purification of high-X ("chi") diblock copolymers. Such copolymers contain two segments ("blocks") of polymers with significantly different interaction parameters and can be used in directed self-assembly applications.

Saved in:
Bibliographic Details
Main Authors TRAN VI HOANG, FARNHAM WILLIAM BROWN, SHEEHAN MICHAEL THOMAS
Format Patent
LanguageChinese
English
Published 22.10.2014
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CHEMISTRY
CINEMATOGRAPHY
COMPOSITIONS BASED THEREON
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
ELECTROGRAPHY
HOLOGRAPHY
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS
MATERIALS THEREFOR
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
THEIR PREPARATION OR CHEMICAL WORKING-UP
Online AccessGet full text

Cover

More Information
Summary:This invention relates to the preparation and purification of high-X ("chi") diblock copolymers. Such copolymers contain two segments ("blocks") of polymers with significantly different interaction parameters and can be used in directed self-assembly applications.
Bibliography:Application Number: CN201380008774